Correction: Modelling focused electron beam induced deposition beyond Langmuir adsorption

• Dédalo Sanz-Hernández and
• Amalio Fernández-Pacheco

Beilstein J. Nanotechnol. 2017, 8, 2591–2591, doi:10.3762/bjnano.8.259

• Dedalo Sanz-Hernandez Amalio Fernandez-Pacheco Cavendish Laboratory, University of Cambridge, JJ Thomson Cambridge, CB3 0HE, United Kingdom 10.3762/bjnano.8.259 Keywords: adsorption isotherm theory; BET model; continuum model; focused electron beam induced deposition; 3D nanoprinting; Langmuir

Modelling focused electron beam induced deposition beyond Langmuir adsorption

• Dédalo Sanz-Hernández and
• Amalio Fernández-Pacheco

Beilstein J. Nanotechnol. 2017, 8, 2151–2161, doi:10.3762/bjnano.8.214

• types of growth regimes are possible for FEBID under no diffusion, resulting into four types of adsorption isotherms. We propose the use of these maps as a powerful tool for the analysis of FEBID processes. Keywords: adsorption isotherm theory; BET model; continuum model; focused electron beam induced

• curves, which are analogous to those described by the adsorption isotherm theory, but include the electron dissociative term. Finally, we propose FEBID frequency maps as a new tool to analyze experimental data in detail, and as an aid to identify possible steady states and transitions between growth